The class 1000 clean room contains instruments for fabrication of microstructures.

• Ellipsometer/Test Probe and Inspection Station
• Laminar Flow Wet Bench
• Mask Aligner/Exposer
• Optical Microscope
• PVD Coating Chamber
• Tube Furnace

A multipurpose instrument for determining the thickness of oxide layers, perorming inspections, and testing with microprobes.

Make: Modified J.A. Woollam
Stereoscope: Leica Model MZ6
Test Equipment: LabVIEW Virtual Instrumentation

Top Used for spinning, wet chemistry, and work requiring an additional level of cleanliness.

Class: 100 (.3 microns)
Spinner: Headway (3" wafer capacity)
Top Used in photolithography. Aligns masks to existing structures on a wafer and exposes the photo-resist to transfer the mask design.

Make: Karl Suss
Model: MJB 3
Type: UV/400nm
Wafer/Mask Size: 3"/4"
Resolution: 0.6 microns
Alignment Accuracy: 2 microns
Features: Split-field microscope
Top General purpose instrument used extensively to characterize lithographically produced structures.

Make: Leica
Model: DMLM Custom
Type: Reflection, Epi-Illumination
Magnifications: 50X, 100X, 250X, 500X, 1000X
Resolution: .25 microns
Features: Bright field, dark field, differential interference contrasting, Mireau interferometer on 10X objective, Image capture on networked computer, 3-axis-automated stage with position readouts for metrology and patterning.

Top Used to deposit metal or dielectric layers for lithography.

Make: Edwards
Model: Cryo 304
Features: Thermal, 4-hearth e-beam, and 2" magnetron sputter capabilities
Top Used for oxide growth and diffusion.

Make: Lindberg/Blue M
Model: HTF55322C
Max. Temperature: 1200°C, single zone
Capacity: 3" wafers
Gases supplies: dry nitrogen, hydrogen and oxygen, mass-flow meter controlled
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* Mention of commercial products is for information only; it does not imply NIST recommendation or endorsement, nor does it imply that the products mentioned are necessarily the best available for the purpose.

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