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Keck Lab Cleanroom and Metrology Lab

Clean Room

Reserve Clean Room Equipment

The Clean Room is located in JILA X131. It is comprised of three bays:

Fabrication Bay - Class 1000 (ISO 6)

  • Assembly Bench
  • Reactive Ion Etcher
  • Deposition Systems (Sputter Coating)
  • Deposition Systems (Thermal/E-beam)
  • Crtical Point Dryer
  • Optical Microscope
  • Tube Furnace

Lithography Bay - Class 100 (ISO 5)

  • Mask Aligner/Exposer
  • Lithography Laser Writer
  • Spin Coaters
  • Wet Processing Stations
  • Optical Microscope

SEM Bay - Class 1000 (ISO 6)

  • Stylus Profilometer
  • Four-Point Probe
  • Optical Profilometer
  • Scanning Electron Microscope
  • Benchtop Sputterers
  • Wire Bonders

Fabrication Bay - Class 1000 (ISO 6)

assembly bench

Assembly Bench

For sample cleaning, inspection and mounting. Also used for laser cavity assembly.

  • Class: Class 10 (ISO 4)
  • Lighting: Full spectrum LED tubes
  • Features: Leica stereoscope with adjustable LED illumination
reactive ion etcher

Reactive Ion Etch

Used for dry etching and ashing.

  • Make: AXIC
  • Model: PlasmaSTAR
  • Upstream Control: Four 500 sccm mass flow controllers
  • Downstream Control: Nor-Cal Intellysis Butterfly Valve
  • Gases: O2, CF4, CHF3, SF6, C4F8, Ne, Ar
  • Pumping: Edwards QDP80
jila dialectrics

Magnetron Sputter Deposition

  • Make: JILA Custom System
  • Pumping: Turbopump
  • Sources: 2", 3", and 4" diameter DC and RF magnetrons
jila metals

Magnetron Sputter Deposition

  • Make: JILA Custom System
  • Pumping: Cryopump
  • Sources: 2" diameter DC magnetron
edwards ebeam

E-beam Deposition

  • Make: Edwards Auto 306
  • Features: 4-hearth e-gun
jila chamber 1

E-beam Deposition

  • Make: JILA Custom System
  • Usage: Restricted to high purity aluminum
  • Pumping: Cryopump
  • Features: MDC EVAP300 4-hearth e-gun, high-precision tilt deposition, in-situ oxidation
critical point dryer

Critical Point Dryer

For drying samples without going through density changes.

  • Make: Bal-Tec AG
  • Model: CPD 030
  • Payload Space: 40 mm diameter x 36 mm
  • Transfer Medium: IPA
  • Transitional Medium: CO2
fab microscope

Optical Microscope

  • Make: Leica
  • Model: MZ6
  • Type: Stereoscopic
  • Magnifications: 6.3X to 40X Zoom
tube furnace

Tube Furnace

Used for oxide growth, annealing, and diffusion.

  • Make: Lindberg/Blue M
  • Model: HTF55322C
  • Max Temperature: 1100 C
  • Capacity: 3" wafers
  • Gas supplies: nitrogen, hydrogen, oxygen, argon
  • Flow Control: Two mass flow meters, 5 liters/minute max
  • Temperature Control: Programmable ramp/soak controller

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Lithography Bay - Class 100 (ISO 5)

mask aligner

Mask Aligner/Exposer

For photolithography. Aligns masks to existing structures on a wafer and exposes the photo-resist to transfer the mask design.

  • Make: Karl Suss
  • Model: MJB 3
  • Type: UV/400nm
  • Wafer/Mask Size: 3"/4"
  • Alignment Accuracy: 2 microns
  • Features: Split-field microscope
laser_writer

Lithography Laser Writer

Pattern writing directly on wafer or glass substrate with photoresist

  • Make: Raith
  • Model: PicoMaster 100
  • Wavelengths: 375nm
  • Minimum Feature Size: 300nm
  • Wafer Sizes: 2", 3", and 4"
  • Features: Backside Alignment
spin coater 1

Spin Coater

For coating resist and other materials on substrates. Located on solvent bench.

  • Make: Headway Research Inc.
  • Model: EC101DT-R485
  • Type: Single channel, non-programmable
  • Speed Range: 0 - 10k RPM
  • Maximum Substrate Diameter: 4 inches
  • Features: Foot pedal control, custom chucks
spin coater 2

Spin Coater

For coating resist and other materials on substrates. Located on solvent bench.

  • Make: Laurell Technologies Corporation
  • Model: WS-650Mz-23NPPB
  • Type: Programmable
  • Speed Range: 0 - 13k RPM
  • Maximum Substrate Diameter: 6 inches
  • Features: Enclosed chamber with nitrogen purge
solvent bench

Solvent Bench

Bench used for solvent cleaning, spin coating, developing.

  • Make: JST Manufacturing Incorporated
  • Model: Custom 96" Stainless Steel
  • Features: Sink, UHP water, dry nitrogen gun, filtered LED illumination, underbench storage with pullout trays, solvent catch carboy
hf bench

Bases and HF Bench

Fume hood bench dedicated for Bases and HF use

  • Make: JST Manufacturing Incorporated
  • Features: Sink, UHP water, dry nitrogen gun, filtered LED illumination, underbench storage
acid bench

Acid Bench

Fume hood bench used for acid cleaning and etching.

  • Make: Terra Universal
  • Model: 2000-18 60" Polypropylene
  • Features: Sink, UHP water, dry nitrogen gun, vacuum port, polycarbonate sash, underbench storage with vented acid cabinet
microscope

Optical Microscope

  • Make: Leica
  • Model: DMLM Custom
  • Type: Reflection, Epi-Illumination
  • Magnifications: 50X, 100X, 250X, 500X, 1000X
  • Stage Travel: 4" x 4"
  • Maximum Height: 6"
  • Camera: Leica EC4
  • Features: Brightfield, Darkfield, DIC, Mireau interferometer on 10X objective, Rotatable stage

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SEM Bay - Class 1000 (ISO 6)

stylus profilometer

Stylus Profilometer

For measuring step height and surface roughness.

  • Make: Bruker
  • Model: DektakXT
  • Scan Length: 50 microns to 55 mm in one direction only
  • Tip radius: 12.5 micron and 2 micron
  • Features: Vibration isolation, VLSI step height standard
four point probe

Four-Point Probe

For measuring sheet resistance and volume resistivity.

  • Make: Jandel Engineering
  • Model: HM21
  • Range: 1 to 10 Megohms (.01 Ohms measurable)
  • Currents: 100nA, 1, 10, 100 microamps, 1mA, 10mA
  • Accuracy: 0.3%, 0.5% greater than 1mV
  • Probe tip radius: 100 microns
  • Smallest sample: 5mm
  • Features: PC datalogging, CSV output, Bulk resistivity calculation
optical profilometer

Optical Profilometer

Measures feature height and surface quality.

  • Make: Wyko
  • Model: NT2000
  • Type: White light vertical scan interferometer, 602nm phase shift interferometer
  • Objectives: 5X Mickelson, 20X Mireau, 50X Mireau
  • Multipliers: 0.5X, 0.62X, 1X
  • Camera: 1 MP
  • Stage: 8" x 8" motorized
  • Features: Automated stitching, VLSI step height standards
sem

Scanning Electron Microscope

This instrument is located in a specially constructed area designed to minimize vibrational, acoustic and electromagnetic interference. It is used for imaging and electron-beam writing.

  • Make: FEI
  • Model: Nova NanoSEM 630
  • Detectors: Everhart-Thornley, TLD
  • Acceleration Voltages: 50V-30 KeV
  • Magnification: 35X-1.6MX
  • Resolution: 0.8nm @ 30KeV
  • Maximum Sample Size: 150 x 150mm
  • Features: E-beam patterning capabilities, 3D imaging
anatech

Benchtop SEM coater

For coating non-conductive SEM samples

  • Make: Anatech USA
  • Model: Hummer VI-A
  • Targets: Au/Pd, Au, and Pt
wire bonder

Wire Bonders

Used for connecting wires to device.

  • Type: Manual Wedge, Two Way Convertible
  • Make: West-Bond
  • Models: 7476E (63kHz)
  • Wire: Aluminum and Gold, 1 and 2 mil

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