Assembly Bench

For sample cleaning, inspection and mounting. Also used for laser cavity assembly.

• Class: Class 10 (ISO 4)
• Lighting: Full spectrum LED tubes
• Features: Leica stereoscope with adjustable LED illumination

Reactive Ion Etcher

Used for dry etching and ashing.

• Make: AXIC Inc.
• Model: PlasmaSTAR
• Upstream Control: Four 500 sccm mass flow controllers
• Downstream Control: Nor-Cal Intellysis Butterfly Valve
• Gases: O2, CF4, CHF3, SF6, C4F8, Ne, Ar
• Pumping: Edwards QDP80

Magentron Sputter Deposition

• Make: JILA Custom System for Dielectrics
• Pumping: Dry scroll semiconductor pump, turbopump
• Sources: 2", 3", and 4" diameter circular RF magnetrons
• Features: Multiple ports for in-situ thickness measurements
• Thermal Source: One 1kVA transformer

Magentron Sputter Deposition

• Make: JILA Custom System for Metals
• Pumpking: Dry scroll semiconductor pump, cryopump
• Sources: 2", 3", and 4" diameter circular DC magnetrons
• Features: Multiple ports for substrate holders, heated platen option
• Thermal Sources: One 2kVA transformer and one 4kVA transformer

Thermal/E-beam Deposition

• Make: Edwards
• Model: Auto 306 Cryo
• Features: Edwards EB3 4-hearth e-gun, 2"magnetron sputter capabilities
• Thermal Source: One 2kVA transformer

E-beam Deposition

• Make: JILA Custom System
• Usage: Restricted to high purity aluminum
• Pumping: Dry scroll semiconductor pump, cryopump
• Features: MDC EVAP300 4-hearth e-gun, high-precision tilt deposition, in-situ oxidation

Critical Point Dryer

For drying samples without going through density changes.

• Make: Bal-Tec AG
• Model: CPD 030
• Payload Space: 40 mm diameter x 36 mm
• Transfer Medium: IPA
• Transitional Medium: CO2

Optical Microscope

Tube Furnace

Used for oxide growth, annealing, and diffusion.

Mask Aligner/Exposer

For photolithography. Aligns masks to existing structures on a wafer and exposes the photo-resist to transfer the mask design.

• Make: Karl Suss
• Model: MJB 3
• Type: UV/400nm
• Wafer/Mask Size: 3"/4"
• Alignment Accuracy: 2 microns
• Features: Split-field microscope

Lithography Laser Writer

For photolithography. Pattern writing directly on a substrate or glass mask

Spin Coater

For coating resist and other materials on substrates. Located on solvent bench.

Spin Coater

For coating resist and other materials on substrates. Located on solvent bench.

Solvent Bench

Bench used for solvent cleaning, spin coating, developing.

HF Bench

Fume hood bench dedicated for HF use only.

Acid Bench

Fume hood bench used for acid cleaning and etching.

Optical Microscope