The W. M. Keck Optical Measurements Laboratory is located in JILA S105 and contains a suite of instruments for characterizing optical sources and the optical properties of materials.
Displays the spatial profile of a laser beam and beam propagation information (cart).
Data acquision device for vibration, acoustic, and electromagnetic measurements.
Determines the thickness and optical constants of thin dielectric films. Used to characterize optical coatings
Used for straight and angle cleaving of fiber optics.
Produces very low loss splices between optical fibers by fusing the fibers together.
Wavefront analyzer for characterizing the flatness of optical elements.
Used for measuring emission spectrum of a sample as a function of excitation wavelength.
Measures the transmission and reflection properties of optical elements and materials in the far infrared.
Used for routine light microscopy.
Used for routine light microscopy.
Measures optical power.
Measures feature height and surface quality.
Measures the transmission and reflection properties of optical elements and materials from the ultraviolet to near infrared wavelengths.