Tutorials
The Keck Lab requires instruction in the operation of all instuments, tools and software in the lab. The tutorials are given on an as-needed basis. They may include supplemental instruction on topics such as safe lab practices, chemistry, and vacuum technology. The following is a list of tutorials with a brief description of what is covered in each course. Please contact the Keck Lab manager if you are interested in taking one of the courses.
- Atomic Force Microscopy
- Critical Point Dryer
- E-beam Lithography
- Ellipsometry
- Fizeau Interferometry
- Photolithography
- Profilometry
- Scanning Electron Microscopy
- Spectrophotometry
- Wire Bonding
- Miscellaneous Equipment and Techniques
Atomic Force Microscopy
Average Time: 4 hoursPrerequisites: None
Operation of both the dimensional atomic force microscope is covered in this course. Topics include probe evaluation and alignment, sample preparation and mounting, scanning techniques, image capturing and manipulation, and analysis techniques.
Critical Point Dryer
Average Time: 1 hourPrerequisites: None
Operation and care of the Critical Point Dryer is covered in this course.
E-beam Lithography
Average Time: 8 hoursPrerequisites: Scanning electron microscopy tutorial, training or course work in micro lithography and chemistry
Techniques in the use of the scanning electron microscope to produce submicron- and nanometer- scale features are demonstrated. Patterning techniques are covered extensively, including CAD and wafer alignment for multiple layer features. Multi-resist layer and lift-off techniques are covered. Other topics include scanning-electron, atomic force and light microscopy for evaluation, prudent lab practices unique to nanofabrication, and some post-patterning techniques. The nanopatterning software is described in detail.
Ellipsometry
Average Time: 3 hoursPrerequisites: Knowledge of the fundamentals of optics is preferred
The principles and practices of ellipsometry covered in this course. These include the proper use of a variable angle, spectroscopic ellipsometer, sample alignment and targeting, data acquisition techniques, and application software familiarization. Methods for acquiring variable angle transmission and absorption spectra and determining optical constants are described.
Fizeau Interferometry
Average Time: 1/2 hourPrerequisites: None
This course covers the use and techniques of the Fizeau interferometer which determines flatness and surface quality of optical components.
Photolithography
Average Time: 6 hoursPrerequisites: Course work in chemistry and some fabrication lab experience preferred
Principals and practices of photolithography are covered, including theory, spin coating, mask aligning/exposure, developing, and evaluation.
Profilometry
Average Time: 1 hour for eachPrerequisites: None
Instruction is given on the proper use of either the optical profilometer in the metrology lab or the optical or stylus profilometer in the SEM bay in the clean room.
Scanning Electron Microscopy
Average Time: 6 hoursPrerequisites: Working knowledge of vacuum systems
This comprehensive course covers the proper use, alignment, image acquisition and capture, and care of the scanning electron microscope. Also covered is specimen preparation and mounting, including sputtering. Users are shown how to use several image-capture and analysis software packages on the microscope.
Spectrophotometry
Average Time: 1 hourPrerequisites: None
This tutorial covers the proper use and care of the UV-VIS-NIR and FTIR spectrophotometers in the lab. It includes specimen preparation, tooling and mounting, alignment, and software familiarization.
Wire Bonding
Average Time: 2 hourPrerequisites: None
This tutorial covers the proper use and care of the wire bonders in the clean room.
Miscellaneous Equipment and Techniques
Average Time: VariablePrerequisites: None
The Keck lab manages a number of smaller instruments for use on site within the JILA building. Instruction is available for instruments such as a beam profiler, optical fiber cleaver, fusion splicer, and data logger for the accelerometers and magnetometers. In addition, tools are available for use in the Keck Metrology Lab, including stereo and epi-illumination and transmission light microscopes with image and live video capture capabilities. Instruction on the fundamentals of CAD for creating E-beam patterns or glass masks for photolithography is also available through the Keck Lab.
