Tutorials
Tutorials
The Keck laboratory offers instruction in the operation of the measuring instruments and software in the lab. The tutorials are given on an as-needed basis. They may include supplemental instruction on topics such as safe lab practices, chemistry, vacuum technology, and virtual instrumentation. Not only are these tutorials available to JILA faculty, students, and staff, but they are offered also to members of the University of Colorado community and the private sector for a nominal hourly fee. The following is a list of tutorials with a brief description of what is covered in each course. Please contact the Keck Lab manager if you are interested in taking one of the courses.

David Alchenberger
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Atomic Force Microscopy
Average Time: 4 hours
Prerequisites: None


Operation of both the multimode and dimensional atomic force microscopes are covered in this course. Topics include probe evaluation and alignment, sample preparation and mounting, scanning techniques, image capturing and manipulation, and analysis techniques. Because one of the instruments is in the clean room, clean room protocols are also covered.

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E-beam Lithography
Average Time: 12 hours
Prerequisites: Scanning electron microscopy tutorial, training or course work in micro lithography and chemistry

Techniques in the use of the scanning electron microscope to produce submicron- and nanometer- scale features are demonstrated. A sample wafer is taken from preparation to evaluation in this course. Patterning techniques are covered extensively, including CAD and wafer alignment for multiple layer features. Multi-resist layer and lift-off techniques are covered. Other topics include scanning-electron, atomic force and light microscopy for evaluation, prudent lab practices unique to nanofabrication, and some post-patterning techniques. The nanopatterning software is described in detail.

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Ellipsometry
Average Time: 3 hours
Prerequisites: Knowledge of the fundamentals of optics is preferred

The principles of ellipsometry covered in this course. These include the use and care of a variable angle, spectroscopic ellipsometer, sample alignment and targeting, data acquisition techniques, and application software familiarization. Methods for acquiring variable angle transmission and absorption spectra and determining optical constants are described.

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Fizeau Interferometry
Average Time: 1 hour
Prerequisites: None

This mini-course covers the use and techniques of the Fizeau interferometer which determines flatness and surface quality of optical components.

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Scanning Electron Microscopy
Average Time: 6 hours
Prerequisites: Working knowledge of vacuum systems

This comprehensive course covers the proper use, alignment, image acquisition and capture, and care of the scanning electron microscope. Also covered is specimen preparation and mounting, including sputtering. Users are shown how to use several image-capture and analysis software packages on the microscope.

Photolithography
Average Time: 6 hours
Prerequisites: Working knowledge of vacuum systems

Principals and practices of photolithography are covered.

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Spectrophotometry
Average Time: 2 hours
Prerequisites: None

This tutorial covers the proper use and care of the UV-VIS-NIR and FTIR spectrophotometers in the lab. It includes specimen preparation, tooling and mounting, alignment, and software familiarization.

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Miscellaneous Equipment and Techniques
Average Time: Variable
Prerequisites: None

The Keck lab manages a number of smaller instruments for use on site within the JILA building. Instruction is available for instruments such as a beam profiler, polarimeter, frequency-resolved optical gate, optical fiber cleaver, and fusion splicer. In addition, tools are available for use in the Keck lab, including a sputter coater, stereo and epi-illumination light microscopes with image and live video capture capabilities, wire wedge bonder, an iodine-stablized HeNe laser and a lambda meter. Connection to the Keck lab and between labs within JILA and physics via a fiber optic patch system is described in a brief tutorial. Instruction on the fundamentals of CAD for creating E-beam patterns or glass masks for photolithography is also available through the Keck lab.

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